Technical Support for all
PLASMA MONITOR AND PROCESS CONTROL SYSTEMS
There are several EMICON series which satisfy different application types:
EMICON MC: multi-channel standard system for plasma monitoring and process control.
EMICON SA: stand-alone system with integrated process unit for process control in production lines.
EMICON HR: spectral high-resolution system for detailed plasma analysis and plasma monitoring.
Process control is essential in industrial plasma applications to ensure reliability and high quality of the process. Here, optical emission spectroscopy (OES) is a first choice technique since it does not affect the plasma and since real-time monitoring of several plasma species is possible. Our PLASUS EMICON systems come with all the features you need to analyze, optimize and control your plasma application.