There are several EMICON series which satisfy different application types:

PLASMA MONITOR AND PROCESS CONTROL SYSTEMS

Process control is essential in industrial plasma applications to ensure reliability and high quality of the process. Here, optical emission spectroscopy (OES) is a first choice technique since it does not affect the plasma and since real-time monitoring of several plasma species is possible. Our PLASUS EMICON systems come with all the features you need to analyze, optimize and control your plasma application.

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